China stockpiles ASML lithography tools, spurring US calls for complete export ban
Chinese semiconductor plants have accumulated hundreds of immersion lithography machines, prompting calls from former US officials for a complete export ban. A report by the Centre for Technology & Statecraft (CTS) estimates Chinese-owned fabs acquired 343 immersion deep ultraviolet (DUV) systems by early 2026.
The Centre for Technology & Statecraft (CTS) report adds new data to discussions in Washington concerning export controls on DUV tools to China. Co-authored by former US export control official Nicholas Brown and former White House adviser Saif Khan, the study suggests that Chinese fabs have amassed a significant number of these machines.
While DUV tools are not as advanced as EUV systems, the report indicates they can be adapted to manufacture 7-nm logic chips and advanced memory for AI processors. This adaptability is a key point in the argument for a total blockade on DUV tools, as it suggests a pathway for China to advance its domestic chip production despite existing restrictions.
The estimated acquisition of 343 immersion DUV systems by early 2026 suggests a strategic move by Chinese semiconductor manufacturers. This accumulation could be an effort to build a sufficient installed base of equipment to sustain production capabilities, potentially mitigating the impact of any future, more stringent export controls.
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