Samsung's Next-Generation Chip Process Leaked Through University Research Tie-Up

The indictment concerns a university researcher, identified as A, who allegedly transferred sensitive semiconductor process data while participating in a joint research project with Samsung Electronics. The removed material reportedly included information on extreme ultraviolet (EUV) lithography for an unreleased next-generation product. EUV is a critical technology that uses short-wavelength light to etch fine circuits, essential for increasing chip density and streamlining manufacturing steps, with the data covering details like photoresist types and specific process conditions.

Investigators found that the researcher had temporary employee status at Samsung, granting access to internal technical documents through a university-industry cooperation foundation. This incident highlights an evolving challenge in technology protection, as leaks now increasingly exploit legitimate business relationships, such as academic partnerships or consulting contracts, rather than solely involving traditional insider threats or direct transfers for money. Such methods complicate early detection of unauthorized data removal.

While the prosecution is examining the possibility of external transfers, there is no confirmation that the material was passed abroad, including to China. Samsung reportedly detected the data removal at an early stage, enabling an investigation before any overseas leak occurred. A court rejected a request for a detention warrant, citing that substantial evidence had been secured and the researcher cooperated with questioning.